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Industrial
applications of nanoparticles Semiconductor-polishing slurries. One of the most well-established and widespread uses of nanoparticles today occurs during chemical mechanical planarization (CMP), a highly precise polishing process that is used during the production of integrated circuits on semiconductor chips. During CMP, nanoscaled particles of abrasive materials typically oxides of aluminum and zirconium, colloidal or fumed silica, and cerium, with particle diameters of 20300 nm in dia. are formulated in a polishing slurry that is used to make the metal and dielectric layers on silicon wafers smooth and defect-free.
Representative companies that produce nanoscaled particles for use in CMP slurries, and the slurries themselves, include Cabot Microelectronics (Boston, Mass.; cabot-corp.com, Rohm and Haas Electronic Materials CMP Technologies (Marlborough, Mass.; electronicmaterials.rohmhaas.com), Honeywell (Morris Township, N.J.; honeywell.com), Bayer AG (Leverkusen, Germany; bayer.com), DA NanoMaterials LLC (a joint venture between DuPont and AirProducts Nanomaterials; Tempe, Ariz.; nanoslurry.com), Eka Chemicals (ekachemicals.com), Praxair Surface Technologies (North Haven, Conn., Praxair.com), Nanophase Technologlies (Romeoville, Ill.; nanophase.com), and others. Polymeric composites. In recent years, a
variety of advanced composite materials have been developed by adding relatively small
amounts of carbon nanotubes and/or nanoscaled particles of various other materials to
polymeric resins. The resulting nanocomposite that can demonstrate a range of improved
material characteristics, such as electrical conductivity, catalytic activity, hardness
and scratch resistance, fire retardancy, diffusion-barrier characteristics (such as
reduced gas permeability), and even self-cleaning capabilities and anti-microbial
properties. Consumer
products. Makers of sunscreens, cosmetics and other personal-care products have
discovered that the use of nanometer-scaled versions of common additives can improve the
effectiveness and aesthetic appeal of many products, compared to conventional
formulations. For instance, with the advent
of affordable methods to produce and use nanoscaled particles of the common
ultraviolet-light blockers titanium dioxide (TiO2) and zinc oxide (ZnO),
sunscreen manufacturers are already using these broad-spectrum UV-blocking agents to
produce transparent lotions that are aesthetically superior to the opaque white oxide
creams that are the hallmark of surfers and lifeguards. Similarly, nanoparticles of TiO2
are also being used to add UV-blocking functionality to varnishes, textile fibers and
packaging films.
Similar advances
are being pursued in gas chromatography. For instance, miniaturized gas chromatography
(GC) modules for gas analyzers have historically been limited to applications involving
the measurement of organic compounds. However, SLS
Microtechnology GmbH ( Catalyic and
photocatalytic applications. The enormous surface area advantage of nanoscaled
particles also supports the development of highly effective catalysts for various chemical
process operations and pollution-control applications. The fact that these scaled-down
particles have a proportionately greater number of atoms on their surface, compared to
their interior, leads to greater reactivity, which has inspired most of the major catalyst
makers, including Engelhard Corp. (Iselin,
N.J.; englhard.com) and Johnson Matthey (Wayne,
Pa.; matthey.com) to pursue catalyst advances based on nanoscaled materials. |
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